Thin film transfer, organic electroluminescence display device and manufacturing method of the same

ABSTRACT

An organic EL display device has a substrate, a plurality of organic EL elements formed on the substrate and a plurality of thin film transistors formed on the substrate. The transistors are connected to the respective EL elements for controlling current applied to the respective elements. Each of the transistors includes an active layer of semiconductor material, formed on the substrate, a source region and a drain region being formed in the active layer, a source electrode of aluminum material electrically coupled to the source region formed in the active layer, a drain electrode of aluminum material electrically coupled to the drain region formed in the active layer, an insulation layer formed on the active layer, a gate electrode formed on the insulation layer, a first barrier metal layer of titanium nitride containing equal to or less than 50 atm % of nitrogen or titanium, inserted between the source electrode and the source region of the active layer, and a second barrier metal layer of titanium nitride containing equal to or less than 50 atm % of nitrogen or titanium, inserted between the drain electrode and the drain region of the active layer.

This application is a Divisional application of Ser. No. 08/855,391,filed May 13, 1997 U.S. Pat. No. 5,897,328; which itself is a Divisionalof Ser. No. 08/617,121, filed Mar. 18, 1996, now U.S. Pat. No.5,640,067.

FIELD OF THE INVENTION

The present invention relates to a thin film transistor used in anorganic electroluminescence (EL) display device, the organic EL displaydevice and a method of manufacturing the organic EL display device.

DESCRIPTION OF THE RELATED ART

In an organic EL display device, many of organic EL elements arearranged in matrix on a substrate. Each of the EL elements, namely apixel (picture element), consists of a transparent electrode layer, anorganic EL layer and an upper electrode layer. At least one thin filmtransistor for controlling current applied to the EL element iselectrically connected to this EL element.

In general, each of the thin film transistors has a silicon active layerwith a source region and a drain region, and source and drain electrodesof aluminum material to be electrically connected to the source anddrain regions, respectively. In the conventional thin film transistor,barrier metal layers made of chrome material are inserted between thesilicon active layer and the source and drain electrodes so as toprevent silicon atoms in the silicon active layer from being diffusedand disappeared into the source and drain electrodes of aluminummaterial.

However, according to the conventional organic EL display device, chromeused for material of the barrier metal layers of the thin filmtransistors often elutes into the upper electrode layers and thetransparent electrode layers of the EL elements causing the thin filmtransistors to short-circuit with the upper electrode layers or thetransparent electrode layers. Subsequently to this, all the chrome ofthe barrier metal layers may elute so that hollow spaces will be formedbetween the source and drain regions of the silicon active layers andthe aluminum source and drain electrodes. This results disconnection ofthe source and drain regions and the respective electrodes. Theseshort-circuit and disconnection will stop operations of the thin filmtransistors causing reliability of the organic EL display device toextremely lower.

SUMMARY OF THE INVENTION

It is therefore an object of the present invention to provide a thinfilm transistor used in an organic EL display device, the organic ELdisplay device and a method of manufacturing the organic EL displaydevice, whereby short-circuit and disconnection in the organic ELdisplay device due to elusion of the barrier metal material of the thinfilm transistors can be prevented from occurring to keep highreliability of the organic EL display device.

According to careful study by the inventors of this application, it hascome out that the aforementioned short-circuit and disconnection arecaused by movement of ionized chrome to the organic EL elements. Theionization of the chrome and the movement of the ionized chrome will beoccurred due to moisture provided from the organic EL layer made of highhydroscopic material and due to relatively high DC current (biascurrent) continuously flowing through the current control thin filmtransistors connected to the EL elements and through switching thin filmtransistors connected to and for driving the respective current controltransistors.

Thus, according to the present invention, a thin film transistor whichis formed in an organic EL display device having a substrate and aplurality of organic EL elements formed on the substrate is provided.This transistor used to drive one of the EL elements includes an activelayer of semiconductor material, formed on the substrate, a sourceregion and a drain region being formed in the active layer, a sourceelectrode of aluminum material electrically coupled to the source regionformed in the active layer, a drain electrode of aluminum materialelectrically coupled to the drain region formed in the active layer, aninsulation layer formed on the active layer, a gate electrode formed onthe insulation layer, a first barrier metal layer of titanium nitridecontaining equal to or less than 50 atm % of nitrogen or made oftitanium, inserted between the source electrode and the source region ofthe active layer, and a second barrier metal layer of titanium nitridecontaining equal to or less than 50 atm % of nitrogen or made oftitanium inserted between the drain electrode and the drain region ofthe active layer.

According to the present invention, also, an organic EL display devicehaving a substrate, a plurality of organic EL elements formed on thesubstrate and a plurality of thin film transistors formed on thesubstrate is provided. The transistors are connected to the respectiveEL elements for controlling current applied to the respective elements.Each of the transistors includes an active layer of semiconductormaterial, formed on the substrate, a source region and a drain regionbeing formed in the active layer, a source electrode of aluminummaterial electrically coupled to the source region formed in the activelayer, a drain electrode of aluminum material electrically coupled tothe drain region formed in the active layer, an insulation layer formedon the active layer, a gate electrode formed on the insulation layer, afirst barrier metal layer of titanium nitride containing equal to orless than 50 atm % of nitrogen or made of titanium, inserted between thesource electrode and the source region of the active layer, and a secondbarrier metal layer of titanium nitride containing equal to or less than50 atm % of nitrogen or made of titanium, inserted between the drainelectrode and the drain region of the active layer.

Since the barrier metal layers in the current control thin filmtransistors arranged nearest to the respective organic EL elements aremade of titanium nitride containing equal to or less than 50 atm % ofnitrogen or made of titanium, no elusion of the barrier metal layersoccurs resulting no short-circuit nor disconnection in the organic ELdisplay device to keep high reliability of the organic EL displaydevice.

It is preferred that each of the organic EL elements includes atransparent electrode layer formed on the substrate, an organic EL layerformed on the transparent electrode layer and an upper electrode layerformed on the organic EL layer, the transparent electrode beingelectrically coupled to a conductive lead of aluminum material, and thateach of the organic EL elements further includes a contact metal layerof titanium nitride containing equal to or less than 50 atm % ofnitrogen or made of titanium, inserted between the transparent electrodelayer and the conductive lead. The above-mentioned conductive lead maybe connected to the drain electrode.

Since both the barrier metal layers in the current control thin filmtransistors and the contact metal layer in the organic EL elements aresimultaneously manufactured in the same process, manufacturing cost canbe decreased. Of course, the contact metal layers made of titaniumnitride containing equal to or less than 50 atm % of nitrogen or made oftitanium will result tight and stable contact between the respectiveconductive leads of aluminum and the respective transparent electrodelayers.

According to the present invention, furthermore, an organic EL displaydevice of active matrix type having a substrate, a plurality of organicEL elements formed on the substrate and a plurality of first and secondthin film transistors formed on the substrate is provided. The firsttransistors are connected to the respective EL elements for controllingcurrent applied to the respective elements, and the second transistorsare connected to the respective first transistors for switching therespective first transistors. Each of the first and second transistorsincludes an active layer of semiconductor material, formed on thesubstrate, a source region and a drain region being formed in the activelayer, a source electrode of aluminum material electrically coupled tothe source region formed in the active layer, a drain electrode ofaluminum material electrically coupled to the drain region formed in theactive layer, an insulation layer formed on the active layer, a gateelectrode formed on the insulation layer, a first barrier metal layer oftitanium nitride containing equal to or less than 50 atm % of nitrogenor made of titanium, inserted between the source electrode and thesource region of the active layer, and a second barrier metal layer oftitanium nitride containing equal to or less than 50 atm % of nitrogenor made of titanium, inserted between the drain electrode and the drainregion of the active layer.

It is preferred that each of the organic EL elements includes atransparent electrode layer formed on the substrate, an organic EL layerformed on the transparent electrode layer and an upper electrode layerformed on the organic EL layer, the transparent electrode beingelectrically coupled to a conductive lead of aluminum material, and thateach of the organic EL elements further includes a contact metal layerof titanium nitride containing equal to or less than 50 atm % ofnitrogen or made of titanium, inserted between the transparent electrodelayer and the conductive lead. The above-mentioned conductive lead maybe connected to the drain electrode.

According to the present invention, also, a method for manufacturing anorganic EL display device having a plurality of organic EL elements anda plurality of thin film transistors formed on a substrate is provided.Each of the organic EL elements and the thin film transistors ismanufactured by the steps of depositing an active layer of semiconductormaterial on the substrate, forming a source region and a drain region inthe active layer, forming a gate insulation layer on the active layer,forming a gate electrode on the gate insulation layer, depositing aninsulation interlayer on the active layer and the substrate, removingpart of the insulation interlayer to form contact holes on the sourceand drain regions of the active layer and organic EL element formingregion, forming a transparent electrode layer in the organic EL elementforming region on the substrate, simultaneously forming first and secondbarrier metal layers and a contact metal layer of titanium nitridecontaining equal to or less than 50 atm. % of nitrogen or made oftitanium, the first and second barrier metal layers being formed in thecontact holes on the source and drain regions of the active layer, thecontact metal layer being formed on the transparent electrode layer,forming source and drain electrode and a conductive lead of aluminummaterial on the first and second barrier metal layers and the contactmetal layer, respectively, forming an organic EL layer on thetransparent electrode layer, and forming an upper electrode layer on theEL layer.

Further objects and advantages of the present invention will be apparentfrom the following description of the preferred embodiments of theinvention as illustrated in the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a sectional view of a part of a preferred embodiment of anorganic EL display device according to the present invention;

FIG. 2 shows a sectional view of a part of the embodiment shown in FIG.1;

FIGS. 3 a to 3 d show sectional views of a part of manufacturing stepsof the EL display device according to the embodiment shown in FIG. 1;and

FIG. 4 shows a circuit diagram of the EL display device shown in FIG. 1.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 1 shows an organic electroluminescence (EL) element and a currentcontrol thin film transistor for controlling current applied to the ELelement in a preferred embodiment of an organic EL display deviceaccording to the present invention.

In FIG. 1, a reference numeral 101 denotes a transparent substrate suchas a quartz substrate. On the substrate 101, many of the organic ELelements and their peripheral circuit elements such as current controlthin film transistors, switching thin film transistors for switching therespective current control transistors, another thin film transistorswhich constitute peripheral driving circuits and capacitors are formed.

Each of the current control thin film transistors is substantiallyconstituted by an active silicon layer 102 formed on the substrate 101,a gate oxide layer of SiO₂ 103 formed on a central region of the activesilicon layer 102, a gate electrode of phosphorous doped Polysilicon 104laminated on the gate oxide layer 103, a source electrode and conductivelead of aluminum material 113 and a drain electrode and conductive leadof aluminum material 114. The gate electrode 104 can be made of aluminummaterial instead of the phosphorous doped polysilicon. In the activesilicon layer 102, a source region 105, a channel region 106 and a drainregion 107 are formed. To the source region 105 of the active siliconlayer 102, the source electrode and conductive lead 113 is electricallycoupled via a barrier metal layer of titanium nitride which contains 10atm % of nitrogen 110. Also, to the drain region 107 of the activesilicon layer 102, the drain electrode and conductive lead 114 iselectrically coupled via a barrier metal layer of titanium nitride whichcontains 10 atm % of nitrogen 111. An insulation interlayer of SiO₂ 108is formed between the active silicon layer 102 and the conductive leads113 and 114 and between the gate electrode 104 and the barrier metallayers 110 and 11.

Each of the organic EL elements is substantially constituted by atransparent electrode layer of ITO (Indium Tin Oxide) 109 formed on thesubstrate 101, an organic EL layer 115 formed on the transparentelectrode layer 109, an upper electrode layer of a magnesium filmincluding silver material 116 formed on the EL layer 115 and a commonelectrode of aluminum material 118 formed on the upper electrode layer116. The transparent electrode layer 109 is electrically coupled to thedrain conductive lead 114 via a contact metal layer of titanium nitridewhich contains 10 atm % of nitrogen 112. A protection layer of SiO₂ 117is formed between the common electrode 118 and the conductive leads 113and 114.

FIG. 2 shows the switching thin film transistor in the preferredembodiment of the organic EL display device according to the presentinvention.

Each of the switching thin film transistors is substantially constitutedby an active silicon layer 202 formed on the substrate 101, a gate oxidelayer of SiO₂ 203 formed on a central region of the active silicon layer202, a gate electrode of phosphorous doped polysilicon 204 laminated onthe gate oxide layer 203, a source electrode and conductive lead ofaluminum material 213 and a drain electrode and conductive lead ofaluminum material 214. The gate electrode 204 can be made of aluminummaterial instead of the phosphorous doped polysilicon. In the activesilicon layer 202, a source region 205, a channel region 206 and a drainregion 207 are formed. To the source region 205 of the active siliconlayer 202, the source electrode and conductive lead 213 is electricallycoupled via a barrier metal layer of titanium nitride which contains 10atm % of nitrogen 210. Also, to the drain region 207 of the activesilicon layer 202, the drain electrode and conductive lead 214 iselectrically coupled via a barrier metal layer of titanium nitride whichcontains 10 atm % of nitrogen 211. An insulation interlayer of SiO₂ 208is formed between the active silicon layer 202 and the conductive leads213 and 214 and between the gate electrode 204 and the barrier metallayers 210 and 211.

Referring to FIGS. 3 a to 3 d, manufacturing processes of the currentcontrol thin film transistor and the organic EL element of thisembodiment will be described in detail. It should be noted thatmanufacturing processes of the switching thin film transistor andanother thin film transistors which constitute peripheral drivingcircuits of the EL element will be the same as following processes ofthe current control thin film transistor.

As shown in FIG. 3 a, on a transparent substrate 101 such as a quartzsubstrate, a glass substrate or a ceramic substrate, an active siliconlayer 102 with an island shape is formed by depositing an amorphoussilicon layer by a CVD (Chemical Vapor Deposition) method, annealing thedeposited amorphous silicon layer to form a polysilicon layer(solid-phase growth), and then performing patterning process of thepolysilicon layer.

Then, on the active silicon layer 102, a gate oxide layer Of SiO₂ 103and a gate electrode of phosphorous doped polysilicon 104 are formed inlamination. The gate electrode 104 can be made of aluminum materialinstead of the phosphorous doped polysilicon. Thereafter, a sourceregion 105, a channel region 106 and a drain region 107 are formed inthe active silicon layer 102 by an Ion doping method. In thisembodiment, dopant is for example P and the gate electrode 104 is usedas a mask for the doping process. Then, to cover all of these layers, aninsulation interlayer of SiO₂ 108 is deposited.

Then, contact holes are formed by etching the insulation interlayer 108at the source region 105 and at the drain region 107. Also, by thisetching process, the insulation interlayer 108 in a region for formingthe EL element is removed.

Then, an transparent conductive film of ITO, ZnO or SnO is sputtered toform an transparent electrode layer 109 in the EL element forming regionon the substrate 101. Without removing the insulation interlayer 108from the EL element forming region, the transparent electrode layer maybe formed on this insulation interlayer 108 not directly on thesubstrate 101. Thereafter, a titanium nitride film consisting nitrogenof 10 atm % with a thickness of 100 to 1000 Angstrom preferably 500Angstrom is deposited on all of the these layers. Then, this depositedtitanium nitride film is etched to simultaneously form a barrier metallayer of titanium nitride 110 on the source region 105, a barrier metallayer of titanium nitride 111 on the drain region 107 and a contactmetal layer of titanium nitride 112 on the transparent electrode layer109, respectively.

It will be apparent that barrier metal layers of titanium nitride in theswitching thin film transistor and in the another thin film transistorswhich constitute peripheral driving circuits of the EL element can besimultaneously formed in this process.

Then, as shown in FIG. 3 c, an aluminum film with a thickness of 6000Angstrom is deposited by for example sputtering to cover all of theselayers and the deposited aluminum film is etched so as to form a sourceelectrode and conductive lead 113 and a drain electrode and conductivelead 114. Thus, the source electrode and conductive lead of aluminum 113is electrically coupled to the source region 105 of the active siliconlayer 102 via the barrier metal layer of titanium nitride 110, and also,the drain electrode and conductive lead of aluminum 114 is electricallycoupled to the drain region 107 of the active silicon layer 102 via thebarrier metal layer of titanium nitride 111 and to the transparentelectrode layer 109 via the contact metal layer of titanium nitride 112.

Then, as shown in FIG. 3 d, an organic EL layer 115 and an upperelectrode layer of a magnesium film including silver material 116 areformed in the EL element forming region on the transparent electrodelayer 109 by vapor deposition methods using a metal mask. Thereafter, onthese layers, a protection layer of SiO₂ 117 is deposited and a contacthole is etched on the upper electrode layer 116. Finally, a commonelectrode of aluminum material 118 is deposited on all of the matrixportion of the organic EL display device.

In the aforementioned embodiment, it is described that the barrier metallayers 110 and 111 and the contact metal layer 112 are made of titaniumnitride containing 10 atm % of nitrogen. Higher containing amount ofnitrogen in the titanium nitride material will increase degree ofcontact and stability but decrease electrical conductivity. Thus,according to the present invention, this containing amount of nitrogenin the titanium nitride material is selected to a value equal to or lessthan 50 atm % preferably 5 to 15 atm % for obtaining both good stabilityand electrical conductivity.

According to the present invention, since the barrier metal layers inthe current control thin film transistors arranged nearest to therespective organic EL elements are made of titanium nitride containingequal to or less than 50 atm % of nitrogen, no elusion of the barriermetal layers occurs resulting no short-circuit nor disconnection in theorganic EL display device to keep high reliability of the organic ELdisplay device. Furthermore, since both the barrier metal layers in thecurrent control thin film transistors and the contact metal layer in theorganic EL elements are simultaneously manufactured in the same process,manufacturing cost can be decreased. Of course, the contact metal layersof titanium nitride containing equal to or less than 50 atm % ofnitrogen will result tight and stable contact between the respectiveconductive leads of aluminum and the respective transparent electrodelayers.

According to the present invention, also, the barrier metal layers inthe current control thin film transistors and the contact metal layersin the respective organic EL elements can be made of titanium. Thus, noelusion of the barrier metal layers occurs resulting no short-circuitnor disconnection in the organic EL display device to keep highreliability of the organic EL display device. Furthermore, if both thebarrier metal layers in the current control thin film transistors andthe contact metal layer in the organic EL elements can be simultaneouslymanufactured in the same process, manufacturing cost can be decreased.Of course, the contact metal layers of titanium will also result tightand stable contact between the respective conductive leads of aluminumand the respective transparent electrode layers.

As shown in FIG. 4, the organic EL display device according to theembodiment shown in FIG. 1 is constituted by X-direction signal lines401 ₁, 401 ₂, . . . , Y-direction signal lines 402 ₁, 402 ₂, . . . ,power supply lines (Vdd) 403 ₁, 403 ₂, . . . , switching thin filmtransistors 404 ₁, 404 ₂, 404 ₃, 404 ₄, . . . , current control thinfilm transistors 405 ₁, 405 ₂, 405 ₃, 405 ₄, . . . , organic EL elements406 ₁, 406 ₂, 406 ₃, 406 ₄, . . . , capacitors 407 ₁, 407 ₂, 407 ₃, 407₄, . . . , a X-direction peripheral drive circuit 408 and a Y-directionperipheral drive circuit 409.

Each of the pixels of the EL display device is specified by one of theX-direction signal lines 401 ₁, 401 ₂, . . . and one of the Y-directionsignal lines 402 ₁, 402 ₂, . . . If a signal corresponding to picturedata is applied to the X-direction signal line 401 ₂ and Y-directionscanning signal is applied to the Y-direction signal line 402 ₁, theswitching transistor 404 ₂ in the specified pixel turns on. Thus, thecurrent control transistor 4052 controls current flowing from the powersupply line 403 ₂ into the organic EL element 406 ₂ in accordance withthe picture data causing corresponding light emission from this ELelement 406 ₂.

According to the present invention, at least the barrier metal layers inthe current control thin film transistors and preferably the barriermetal layers in the switching thin film transistors are made of titaniumnitride containing equal to or less than 50 atm % of nitrogen or made oftitanium. In manufacturing the EL display device, it is desired that thecontact metal layers in the organic EL elements are simultaneouslyformed in the same process of the barrier metal layers with the samematerial, namely titanium nitride containing equal to or less than 50atm % of nitrogen or titanium. Furthermore, according to the presentinvention, the barrier metal layers in the thin film transistors in theperipheral drive circuits are preferably made of titanium nitridecontaining equal to or less than 50 atm % of nitrogen or made oftitanium.

Many widely different embodiments of the present invention may beconstructed without departing from the spirit and scope of the presentinvention. It should be understood that the present invention is notlimited to the specific embodiments described in the specification,except as defined in the appended claims.

1. An electroluminescence display device comprising: a substrate havingan insulating surface; a first thin film transistor disposed over saidsubstrate, wherein said first thin film transistor comprises an activelayer comprising crystalline silicon including source, drain and channelregions, and a gate electrode adjacent to the channel region; a secondthin film transistor disposed over said substrate, said second thin filmtransistor comprising an active layer comprising crystalline siliconincluding source, drain and channel regions, and a gate electrodeadjacent to the channel region, said gate electrode of the second thinfilm transistor being electrically connected to said drain region of thefirst thin film transistor; an electrode comprising aluminum forelectrically connecting a transparent electrode and said drain region ofthe second thin film transistor; and an electroluminescence layercomprising an organic material disposed adjacent to said transparentelectrode, wherein a direct contact between said electrode and saidtransparent electrode and a direct contact between said electrode andsaid drain region of the second thin film transistor are prevented by abarrier metal layer comprising titanium interposed therebetween.
 2. Anelectroluminescence display device according to claim 1 wherein saidbarrier metal layer further contains nitrogen.
 3. An electroluminescencedisplay device according to claim 1 further comprising a counterelectrode opposed to said transparent electrode with said organicelectroluminescence layer interposed therebetween, wherein said counterelectrode comprises magnesium and silver.
 4. An electroluminescencedisplay device comprising: a substrate having an insulating surface; athin film transistor formed over said substrate, said thin filmtransistor comprising an active layer comprising crystalline siliconincluding source, drain and channel regions; an electrode comprisingaluminum electrically connected to one of said source and drain regions;a barrier metal layer interposed between said electrode and said one ofthe source and drain regions to prevent a direct contact therebetween; atransparent electrode electrically connected to said thin filmtransistor; and an electroluminescence layer comprising an organicmaterial adjacent to said transparent electrode, wherein said barriermetal layer comprises titanium nitride where a concentration of nitrogenis less than 50 atm %.
 5. The display device according to claim 1wherein said barrier metal layer comprises titanium nitride where aconcentration of nitrogen is 50 atm % or less.
 6. The display deviceaccording to claim 4 wherein said concentration of nitrogen is nothigher than 15 atm %.
 7. An electroluminescence display device accordingto claim 4 wherein said transparent electrode comprises indium tinoxide.
 8. An electroluminescence display device comprising: a substratehaving an insulating surface; a thin film transistor formed over saidsubstrate, said thin film transistor comprising an active layercomprising crystalline silicon including source, drain and channelregions; an electrode comprising aluminum electrically connected to oneof said source and drain regions; a barrier metal layer interposedbetween said electrode and said one of the source and drain regions toprevent a direct contact therebetween; a transparent electrodeelectrically connected to said thin film transistor; anelectroluminescence layer comprising an organic material disposedadjacent to said transparent electrode, and a peripheral driving circuitcomprising another thin film transistor formed over said substrate,wherein said barrier metal layer comprises titanium nitride where aconcentration of nitrogen is less than 50 atm %.
 9. The display deviceaccording to claim 8 wherein said barrier metal layer comprises titaniumnitride where a concentration of nitrogen is not higher than 15 atm %.